发明名称 SEMICONDUCTOR PRODUCTION CONTROL
摘要 <p>A method is provided for manufacturing, the method including processing a workpiece (100) in a processing step (105), measuring a parameter (110) characteristic of the processing performed on the workpiece (100) in the processing step (105), and forming an output signal (115, 125) corresponding to the characteristic parameter measured (110). The method also includes setting a target value (130, 145) for the processing performed in the processing step (105) based on the output signal (115, 125).</p>
申请公布号 WO2001050208(A1) 申请公布日期 2001.07.12
申请号 US2000025753 申请日期 2000.09.20
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址