发明名称 CRYSTAL GROWING METHOD AND CRYSTAL GROWING APPARATUS
摘要 An apparatus for crystal growth includes a solid-state component (42) having a region (42a) whose valence electrons have been controlled so as to control the concentration of holes or electrons of a surface portion in response to the environment of a solution (43) containing a macromolecular compound, a pair of counter electrodes (44a) and (44b) provided to hold therebetween a space above the region (42a), and electric insulating materials (46a) and (46b) supporting the counter electrodes (44a) and (44b). The region (42a) is an impurity region formed on a silicon semiconductor substrate. In the crystal growth method, an electric field is applied to the solution (43) across the counter electrodes (44a) and (44b). Under an electric state generated on the surface of the region (42a), a crystal of the macromolecular compound is formed from the solution (43) to which the electric field is applied. <IMAGE>
申请公布号 EP1114886(A1) 申请公布日期 2001.07.11
申请号 EP19990937037 申请日期 1999.08.11
申请人 SUMITOMO METAL INDUSTRIES LIMITED 发明人 SANJOH, AKIRA
分类号 C08J3/00;B01D9/02;C30B7/00;C30B29/58 主分类号 C08J3/00
代理机构 代理人
主权项
地址