| 摘要 |
PURPOSE: Provided is an apparatus for preventing the inside pollution of a coating equipment for forming resist coated films on a wafer rotated at high speed, which can keep the resist solution from being run out of the coating unit to another unit of the equipment by a shield film opened and shut for free movement of the wafer. CONSTITUTION: The apparatus comprises a pneumatic part(20) for inflating air continuously, a main controller(10) providing an electric signal by sensing setting of the wafer(b) in a wafer holder and cutting off the signal when resist films are formed on the wafer, a solenoid valve(30) opened according to the electric signal for passing the air from the pneumatic part through, an air cylinder(40) accumulating air supplied through the valve and pushing the air temporarily, and a wafer exit(50) opened at a shield wall in the coating equipment and blocked by the air provided from the air cylinder. |
