发明名称 CZ SINGLE CRYSTAL DOPED WITH Ga AND WAFER AND METHOD FOR PRODUCTION THEREOF
摘要 <p>There can be provided according to the present invention a silicon single crystal produced according to Czochralski method to which Ga (gallium) is added as a dopant characterized in that a resistivity is 5 OMEGA . cm to 0.1 OMEGA . cm and a method for producing a silicon single crystal to which Ga (gallium) is added as a dopant according to Czochralski method characterized in that Ga is added in a silicon melt in a crucible, a seed crystal is brought into contact with the silicon melt and is pulled with rotating to grow a silicon single crystal ingot. Thereby, a silicon single crystal and silicon single crystal wafer and a method for producing them that can produce a solar cell characterized in that photo-degradation is not caused even in the single crystal having high oxygen concentration and a conversion efficiency of optical energy is very high. &lt;IMAGE&gt;</p>
申请公布号 EP1114885(A1) 申请公布日期 2001.07.11
申请号 EP20000922915 申请日期 2000.04.28
申请人 SHIN-ETSU HANDOTAI CO., LTD;SHIN-ETSU CHEMICAL CO., LTD. 发明人 ABE, TAKAO;HIRASAWA, TERUHIKO;TOKUNAGA, KATSUSHI;IGARASHI, TETSUYA;YAMAGUCHI, MASAFUMI
分类号 C30B15/00;(IPC1-7):C30B29/06;H01L31/028 主分类号 C30B15/00
代理机构 代理人
主权项
地址