COOL STATION OF LOADLOCK CHAMBER FOR CHEMICAL VAPOR DEPOSITION(CVD)

摘要

PURPOSE: A cool station of a loadlock chamber for a chemical vapor deposition(CVD) is to extend a guidance space of robot paddles, thereby preventing a collision between the robot paddles when loading/unloading a wafer. CONSTITUTION: Installation plates spaced away by a predetermined distance are coupled to each other. The installation plates are use to insert and install a plurality of wafers(50) between a lower plate and an upper plate(10). A plurality of guidance grooves(12,22,32) is formed on the lower plate, the upper plate and the guidance plate in a vertical direction in order to guide an entrance and exit of robot paddles(60). The lower plate, the upper plate and the guidance plate are formed in an elliptical shape. A margin interval(T2) between a width(W2) of each guidance groove and the robot paddles is expanded much more in order to prevent a collision between the robot paddles. The width of the guidance groove is 9.82 centimeter to 9.88 centimeter. The margin interval is 2 millimeter to 5 millimeter.