| 摘要 |
PURPOSE: A method for detecting an inferior hole of a monitor pattern is provided to detect an inferior hole by measuring a breakdown voltage of an adjacent hole. CONSTITUTION: The first cell array portion(31) has a standard space. The second cell array portion(32) is formed at one side of the first cell array portion(31). The second cell array portion(32) has a space wider than the standard space. The third cell array portion(33) is formed at the other side of the first cell array portion(32). The third cell array portion(33) has a space narrower than the standard space. The first and the second resistances(34,35) are connected with the first and the second cell array portions(31,32), respectively. The first pad portion(36) is connected with one sides of the first, the second, and the third cell array portions(31,32,33). The second pad portion(37) is connected with the first and the second resistances(34,35), the other sides of the first, the second, and the third cell array portions(31,32,33). An inferior hole of a monitor pattern is detected by measuring output resistance values of the first and the second pad portions(36,37).
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