| 发明名称 |
PLASMA-RESISTANT MEMBER AND PLASMA TREATMENT APPARATUS USING THE SAME |
| 摘要 |
<p>A plasma-resistant member used in a reaction chamber of a plasma treating apparatus is formed of a dense alumina sintered product having an average grain size of 18 - 45 mu m, a surface roughness Ra of 0.8 - 3.0 mu m and a bulk density of 3.90 g/cm<3> or over. <IMAGE></p> |
| 申请公布号 |
EP1114805(A1) |
申请公布日期 |
2001.07.11 |
| 申请号 |
EP19990938610 |
申请日期 |
1999.08.24 |
| 申请人 |
TOSHIBA CERAMICS CO., LTD.;TOKYO ELECTRON LIMITED |
发明人 |
MIYAZAKI, AKIRA;MORITA, KEIJI;NAGASAKA, SACHIYUKI;MORIYA, SYUJI |
| 分类号 |
H05H1/46;B01J19/00;B01J19/08;C04B35/10;C04B35/111;H01J37/32;H01L21/00;H01L21/302;H01L21/3065;(IPC1-7):C04B35/10 |
主分类号 |
H05H1/46 |
| 代理机构 |
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代理人 |
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| 地址 |
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