发明名称 |
GAS SUPPLYING APPARATUS USING MAGNETIC FLUID IN MCVD PROCESS |
摘要 |
PURPOSE: A gas supplying apparatus using magnetic fluid in MCVD process is provided which employs the magnetic fluid for sealing of reactive gases to prevent the reactive gases from leaking. CONSTITUTION: A sealing structure of a shaft(10) which supports rotation of a glass tube(50) and supplies reactive gases in MCVD process is constructed in such a manner that a permanent magnet(40) is placed at a rotary connector(16), a pole piece(30) for forming a magnetic field is set at both sides of the permanent magnet and magnetic fluid(20) is filled between the pole piece and the shaft. The rotary connector is rotatably combined with the shaft through the medium of a bearing(14) to be connected to the glass tube. A plurality of holes are formed on the surface of the shaft to concentrate the magnetic field on the magnetic fluid.
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申请公布号 |
KR20010066535(A) |
申请公布日期 |
2001.07.11 |
申请号 |
KR19990068383 |
申请日期 |
1999.12.31 |
申请人 |
LG CABLE LTD. |
发明人 |
BAE, SANG JUN;KIM, GIL SEON;KWON, YEONG IL;LEE, SU HYEON |
分类号 |
G02B6/00;(IPC1-7):G02B6/00 |
主分类号 |
G02B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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