APPARATUS FOR ADJUSTING SLOPE OF WAFER IN SEMICONDUCTOR EXPOSURE EQUIPMENT

摘要

PURPOSE: An apparatus for adjusting slope of a wafer is to provide a piezoelectric unit changed in length proportionally to an applied current. CONSTITUTION: An upper stage(21) comprises a through hole(21a). The through hole is aligned with a through hole(11) of a wafer holder(10). A lower stage(31) is separated from the bottom of an upper stage(21) with a predetermined distance. A piezoelectric unit is mounted between the upper stage and the lower stage. The piezoelectric unit comprises a piezoelectric stick(32). The piezoelectric stick changes its distance corresponding to the supply of electric power. The distance of the piezoelectric stick changes to lift the upper stage longitudinally. When the lower stage is fixed, the upper stage moves by the change in length of the piezoelectric stick. To detect displacement of the upper stage, an optical sensor is used. A lighting sensor(33a) is attached to the upper stage, and a receiving sensor(33b) is attached to the lower stage.