SYSTEM FOR ESTIMATING METAL POLLUTION

摘要

PURPOSE: A system for estimating a metal pollution is to estimate a variation of device performance according to a surface density of a metal pollution to thereby secure a manufacturing margin. CONSTITUTION: The system for estimating the metal pollution comprises a mixing chamber(10), a distributor(20), a reaction chamber(30) and an accumulator(40). The mixing chamber generates metallic ions as a pollution source by reacting O3 gas with metallic source gas. The distributor distributes the metallic ions at the same flow amount. The reaction chamber performs a deposition process for compulsorily polluting the flow amount, which is distributed to one side, on the wafer. The accumulator accumulates the flow amount, which is distributed to the other side, using a chemical solution having a high metal solubility. A fixed quantity of the metal pollution is obtained through a comparison and analysis of the compulsorily polluted wafer and the chemical wafer.