发明名称 APPARATUS FOR ELIMINATING WAFER PARTICLE OF SEMICONDUCTOR STEPPER
摘要 PURPOSE: An apparatus for eliminating a wafer particle of a semiconductor stepper is provided to remove particles on a wafer holder, by mounting an air nozzle in a predetermined position of a wafer stage of the semiconductor stepper. CONSTITUTION: Air is induced to an air line(109). An air nozzle(106) sprays the air induced through the air line on an upper surface of a wafer holder(16). A switching valve(107) switches on/off the flow of the air sprayed through the air nozzle. A control unit(104) makes the switching valve switch on if an air driving signal is supplied from a driving detection unit. The control unit makes the switching valve switch off if an air stop signal is supplied from the driving detection unit.
申请公布号 KR20010066292(A) 申请公布日期 2001.07.11
申请号 KR19990067891 申请日期 1999.12.31
申请人 ANAM SEMICONDUCTOR., LTD. 发明人 KO, NAM JU
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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