| 摘要 |
PURPOSE: A method for forming an interconnection line for a liquid crystal display(LCD) is provided to simplify a process of forming an insulation layer to insulate the interconnection line with a simple process. CONSTITUTION: An interconnection line(51) is formed using the first metal layer(50) and the second metal layer(52). The first metal layer is formed with an Al series or a Cu series metal of low resistance, and the second metal layer is formed with a single metal like Cr and Mo and Ta and W or an alloy thereof. An overhang is generated in the second metal layer by a difference of etch rate if the line is formed by stacking the first and the second metal layer. The interconnection line is formed by depositing an organic insulation film on the interconnection line where the overhang is generated. The organic insulation film has a good planarization property, and has a dielectric constant below 3. |
