| 摘要 |
PURPOSE: An apparatus for automatically setting mask blade is to reduce damage of a pattern when performing a masking blade process to prevent the damaged pattern from functioning as a foreign material in a next process. CONSTITUTION: The first condensing lens(23), the first reflecting mirror(24), a fly-eye lens(25), the second condensing lens(26), a mask blade(27), the second reflecting mirror(28), a collimating lens(29), a reticle(30) and a projecting lens are disposed in order on a light path of light generated from a mercury lamp(21). A wafer is disposed at a lower portion of the projecting lens to be moved to a step by a wafer chuck. A camera(40) for reading an image of the wafer is disposed at a side of the mask blade. The camera is connected with a displaying panel(41) of a main body so that an operator sets a masking blade setting region while confirming the image of the wafer through the displaying panel.
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