| 摘要 |
PURPOSE: The capping layer for extreme ultraviolet optical device is provided to withstand chemical and physical destruction on an optical device by providing it to the optical device and forming the capping layer with an inactive material. CONSTITUTION: The capping layer covers the surface of the optical device on which a radiation with the same wavelength as the projection beam radiation is made. The capping layer(13) is formed by an inert material. The capping layer has a thickness of 0.5-10 nm in the optical device, and comprises two or three sub-layers of different materials each other. The inert material is C, boron nitride(BN), boron carbide(BC), silicon nitride(Si3N4), silicon carbide(SiC), B, Pd, Ru, Rh, Au, MgF2, LiF, C2F4, TiN and a mixture thereof. |
