Polishing liquid supply apparatus

摘要

A polishing liquid supply apparatus for supplying a polishing liquid to a chemical mechanical polishing apparatus includes a polishing liquid supply system including a polishing liquid tank for storing the polishing liquid; and a polishing liquid supply path for supplying the polishing liquid from the polishing liquid tank to the chemical mechanical polishing apparatus. The polishing liquid supply system is structured so as to shield the polishing liquid therein from external air.