| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an XAFS measuring apparatus by which an XANES and an EXAFS can be measured in a state that a pressure applied to a sample is changed. SOLUTION: In the XAFS measuring apparatus, the angle of incidenceθof X-rays R which are incident on a curved spectral crystal 2 is changed, the energy of X-rays which are incident on a sample S is changed, the intensity of the X-arys which are incident on the sample S and the intensity of X-rays which are transmitted through the sample S are measured by an X-ray detector 12 and an X-ray detector 13, and a change in an absorbance regarding the sample S is measured on the basis of the intensities. While the pressure applied to the sample S is being changed by a sample pressurization control device 9, the XANES and the EXAFS are measured.</p> |
