| 摘要 |
PURPOSE: A method for controlling an exposure system is provided to shorten the time required for the continual exposure of substrates. CONSTITUTION: A controller controls a mask loader so that it can load a mask having patterns and array marks(70). The controller controls a substrate shifter to load a substrate having array marks on a substrate stage and increases a substrate counter by '1'(72). The controller executes ADC(All Distortion Control) to harmonize the array marks on the mask with the array marks on the substrate(74). If location distortions are detected, the controller stores them in its internal memory(76) and drives an exposure lamp so that the substrate can be exposed to the light of the exposure lamp(78). The controller checks whether the value of the substrate counter is more than 'N'(80). If the value of the substrate counter is more than 'N', the controller calculates the average value of location distortions obtained when N numbers of substrates are arrayed(84). The controller checks whether the average value is smaller than a threshold(86). In case that the average value is smaller than the threshold, the controller makes the substrate shifter load the substrate on which the patterns are transferred at the substrate stage(88). The controller executes FDC(First Distortion Control) to accord one of the array marks on the mask with a corresponding array mark on the substrate(90). The controller drives the exposure lamp so that the substrate can be exposed to the light of the exposure lamp(92).
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