| 发明名称 |
Cathodic process for treating an electrically conductive surface |
| 摘要 |
The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a mineral containing coating or film upon a metallic or conductive surface.
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| 申请公布号 |
US6258243(B1) |
申请公布日期 |
2001.07.10 |
| 申请号 |
US19980122002 |
申请日期 |
1998.07.24 |
| 申请人 |
ELISHA TECHNOLOGIES CO LLC |
发明人 |
HEIMANN ROBERT L.;DALTON WILLIAM M.;HAHN JOHN;PRICE DAVID M. |
| 分类号 |
C23C28/00;C25D9/04;(IPC1-7):C25D9/00 |
主分类号 |
C23C28/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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