发明名称 PHOTOGRAPHIC SUBSTRATE, ITS ADJUSTING METHOD, HEAT DEVELOPABLE PHOTOGRAPHIC SENSITIVE MATERIAL AND ITS PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material for plate making excellent in dimensional stability even at a high temperature in heat development, less liable to curl even when provided in a roll shape and suitable for multi-plate printing, a processing method for the photosensitive material, a photographic substrate constituting the photosensitive material and a method for adjusting the substrate. SOLUTION: A biaxially oriented photographic polyester substrate before coating with at least one photographic constituent layer is conveyed and heat- treated in the temperature range from (the glass transition temperature of the substrate) +100 deg.C to the glass transition temperature under 0.01-30 kg/cm2 tension for 0.5-60 min to adjust the photographic substrate.
申请公布号 JP2001188317(A) 申请公布日期 2001.07.10
申请号 JP20000304306 申请日期 2000.10.04
申请人 KONICA CORP 发明人 ONUMA KENJI;EZURE HIDETOSHI;HOSOI YUJI
分类号 G03C1/795;G03C1/498;G03C1/76;(IPC1-7):G03C1/795 主分类号 G03C1/795
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