发明名称 |
PHOTOGRAPHIC SUBSTRATE, ITS ADJUSTING METHOD, HEAT DEVELOPABLE PHOTOGRAPHIC SENSITIVE MATERIAL AND ITS PROCESSING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material for plate making excellent in dimensional stability even at a high temperature in heat development, less liable to curl even when provided in a roll shape and suitable for multi-plate printing, a processing method for the photosensitive material, a photographic substrate constituting the photosensitive material and a method for adjusting the substrate. SOLUTION: A biaxially oriented photographic polyester substrate before coating with at least one photographic constituent layer is conveyed and heat- treated in the temperature range from (the glass transition temperature of the substrate) +100 deg.C to the glass transition temperature under 0.01-30 kg/cm2 tension for 0.5-60 min to adjust the photographic substrate.
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申请公布号 |
JP2001188317(A) |
申请公布日期 |
2001.07.10 |
申请号 |
JP20000304306 |
申请日期 |
2000.10.04 |
申请人 |
KONICA CORP |
发明人 |
ONUMA KENJI;EZURE HIDETOSHI;HOSOI YUJI |
分类号 |
G03C1/795;G03C1/498;G03C1/76;(IPC1-7):G03C1/795 |
主分类号 |
G03C1/795 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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