| 摘要 |
PROBLEM TO BE SOLVED: To cut back the man-hour for forming a groove on a glass substrate surface. SOLUTION: A plasma nitride film 22 of a predetermined thickness is formed on the surface 21a of a glass substrate material 21 by a plasma CVD. Patterning for the groove formation is applied on the plasma nitride film 22. Then, with the patterned plasma nitride film 22 used as a mask, an exposed surface part 21b of the glass substrate material 21 is etched by a glass etching liquid so as to obtain an electrode glass substrate 4 with a groove 10 of a predetermined depth formed. Since only the single plasma nitride film 22 is used instead of using the conventional Au film and Cr film as a mask, the man-hour for the groove formation can be cut back drastically.
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