发明名称 BIPOLAR TRANSISTOR AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a high-speed bipolar transistor, together with its manufacturing method which is easily manufactured. SOLUTION: Related to a bipolar transistor, an external base region is formed of a base region 4B, having low impurity concentration and a heavily-doped external base region 8 with high impurity concentration, so that the resistive contact in the external base region is satisfactory, reducing parasitic capacity between a base and collector. Related to the manufacturing method for a bipolar transistor, the external base region is formed into a heavily-doped region and a lightly-doped region at a ratio between them, by only changing the layout pattern of the heavily-doped external base region 8, so that the number of manufacturing processes will not increase, resulting in easier manufacture and shorter construction period.
申请公布号 JP2001189318(A) 申请公布日期 2001.07.10
申请号 JP19990372544 申请日期 1999.12.28
申请人 NEC CORP 发明人 WATANABE TAKESHI
分类号 H01L29/73;H01L21/331;(IPC1-7):H01L21/331 主分类号 H01L29/73
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