发明名称 |
Method analyzing a semiconductor surface using line width metrology with auto-correlation operation |
摘要 |
A method for analyzing a semiconductor surface having patterned features on the surface is disclosed. At least one patterned feature is scanned to produce a scanned waveform signal having signal segments corresponding to characteristic surface portions of the patterned feature. The signal segments are processed using an auto-correlation function to produce an auto-correlation signal for each characteristic surface portion of the patterned feature. A reference signal having signal segments corresponding to characteristic surface portions of a known patterned feature is provided and each segment of the auto-correlation signal is compared to the respective signal segments of the reference signal.
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申请公布号 |
US6258610(B1) |
申请公布日期 |
2001.07.10 |
申请号 |
US19990347313 |
申请日期 |
1999.07.02 |
申请人 |
AGERE SYSTEMS GUARDIAN CORP. |
发明人 |
BLATCHFORD JAMES W.;JESSEN SCOTT;KANE BRITTIN C.;LAYADI NACE;MCINTOSH JOHN M.;MOLLOY SIMON J. |
分类号 |
H01L21/66;(IPC1-7):G01R31/26 |
主分类号 |
H01L21/66 |
代理机构 |
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主权项 |
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地址 |
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