摘要 |
<p>PROBLEM TO BE SOLVED: To provide a system, a method, and a medium for controlling a wafer processing chamber using two or more processors (within one or more computer processing systems), wherein specified functions are assigned to each processor. SOLUTION: Some embodiments contemplate that each processor may resin within its own computer processor system (each computer processor system being in communication with the other), wherein each computer processor system executes specified functions to control, and maintains certain parameters associated with the manufacture of the wafer. This allows the present invention to react rapidly to maintain rapidly changing desired conditions within a wafer processing chamber and to maintain a greater degree of uniformity of those conditions throughout the wafer.</p> |