发明名称 |
Plasma treatment of conductive layers |
摘要 |
A method for modifying the surface properties such as work function of semiconducting and conducting layers by plasma treatment. Also disclosed are electrical devices such as organic light emitting devices of enhanced performance owing to the use of plasma treatment-modified semiconducting or conducting layers.
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申请公布号 |
US6259202(B1) |
申请公布日期 |
2001.07.10 |
申请号 |
US19990202152 |
申请日期 |
1999.05.05 |
申请人 |
THE TRUSTEES OF PRINCETON UNIVERSITY |
发明人 |
STURM JAMES C.;WU CHUNG-CHIH |
分类号 |
H05B33/28;H01L51/50;H01L51/52;(IPC1-7):H01J1/62;H01J63/04;B05D5/12;H05H1/00;G09G3/22 |
主分类号 |
H05B33/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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