发明名称 |
Thinner for rinsing photoresist and method of treating photoresist layer |
摘要 |
A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability. |
申请公布号 |
AU2027101(A) |
申请公布日期 |
2001.07.09 |
申请号 |
AU20010020271 |
申请日期 |
2000.12.08 |
申请人 |
SAMSUNG ELECTRONICS CO. LTD.;CLARIANT INTERNATIONAL LTD. |
发明人 |
HONG-SICK PARK;JIN-HO JU;YU-KYUNG LEE;SUNG-CHUL KANG;SAE-TAE OH;DOEK-MAN KANG |
分类号 |
G03F7/32;G03F7/16;G03F7/38;G03F7/42;H01L21/027;H01L21/306;H01L21/311 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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