发明名称 |
Method and apparatus for producing single crystal of silicon carbide |
摘要 |
Silicon carbide single crystal is produced by allowing a silicon raw material to continuously react with a carbon raw material to generate gas and allowing the gas to reach a seed crystal substrate on which a silicon carbide single crystal grows. Preferably, the silicon raw material is continuously fed onto the carbon raw material placed in a reaction crucible, and the carbon raw material is maintained at a temperature such that carbon is allowed to react with silicon in a molten or gaseous state to generate the reaction gas. An apparatus used for producing the silicon carbide single crystal comprises a reaction crucible, and a seed crystal substrate disposed in the crucible; and further comprises means for maintaining the carbon raw material placed in the crucible at a temperature such that carbon is allowed to react with silicon in a molten or gaseous state to generate the reaction gas, and means for continuously feeding the silicon raw material onto the carbon raw material placed in the crucible. <IMAGE> |
申请公布号 |
AU2225601(A) |
申请公布日期 |
2001.07.09 |
申请号 |
AU20010022256 |
申请日期 |
2000.12.26 |
申请人 |
SHOWA DENKO KABUSHIKI KAISHA |
发明人 |
MASASHI SHIGETO;KOTARO YANO;NOBUYUKI NAGATO |
分类号 |
C30B23/00;C30B23/02;C30B25/00 |
主分类号 |
C30B23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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