发明名称 |
VOLTAGE RESERVOIR CAPACITOR WITH TRENCH STRUCTURE |
摘要 |
PURPOSE: A voltage reservoir capacitor with a trench structure is provided to form necessary capacitance within a limited area and improve an integration rate of a device by forming a voltage reservoir and a transistor of a structure of a trench. CONSTITUTION: A trench is formed within a semiconductor substrate(20). An insulating layer(21) is formed on the semiconductor substrate(20) of the trench and the surrounding of the trench. An electrode(22) is formed on the insulating layer(21). The trench is filled with the electrode(22). The electrode(22) covers the semiconductor substrate(20) of the surrounding of the trench. A word line turn-on voltage is applied to the electrode(22).
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申请公布号 |
KR20010061373(A) |
申请公布日期 |
2001.07.07 |
申请号 |
KR19990063867 |
申请日期 |
1999.12.28 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
HONG, SEONG JU;KANG, WON JUN |
分类号 |
H01L29/92;(IPC1-7):H01L29/92 |
主分类号 |
H01L29/92 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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