METHOD FOR MANUFACTURING IMAGE SENSOR

摘要

PURPOSE: A method for manufacturing an image sensor is provided to improve a refractive index and a sensitivity of an image sensor by using a micro lens. CONSTITUTION: A flattening layer(26) is formed on a substrate(21) formed with a photo diode(23). An oxide layer is formed on the flattening layer(26). The oxide layer with the same width of the photo diode(23) is formed by etching the oxide layer. A nitride layer is formed on the whole structure. A nitride layer spacer(29a) is formed at a sidewall of the etched oxide layer by etching the nitride layer. A micro lens is formed by forming the nitride layer spacer(29a). The micro lens is formed with the oxide layer and the nitride layer.