发明名称 EXPOSURE METHOD
摘要 PURPOSE: To improve throughput by decreasing the number of times of scanning exposure. CONSTITUTION: Placement of a substrates 14 so as to face horizontally with respect to a substrate holder 15a (placing of the substrate by paralleling its long sides to the short sides of the substrate holder) is permitted by the size of a device and the size of the substrate 14. At this time, the placing of the region exclusive of the effective exposure region of the substrate 14 so as to protrude from the substrate holder is equally well.
申请公布号 KR20010062572(A) 申请公布日期 2001.07.07
申请号 KR20000079532 申请日期 2000.12.21
申请人 SHARP CORPORATION 发明人 NARAKI TSUYOSHI;NISHIMURA YASUNORI;OKETANI TAIMI
分类号 H01L21/027;G03F7/20;G03F7/22;G03F9/00;(IPC1-7):H01L21/027 主分类号 H01L21/027
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