REMOVER FOR PHOTORESIST AND METHOD FOR REMOVING PHOTORESIST USING SAME

摘要

PURPOSE: To provide a remover composition for a photoresist suitable for use particularly in the production of a liquid crystal panel device and excellent in property of preventing the corrosion of a substrate with metallic wiring and an inorganic material layer as well as in ability to remove a photoresist film and a degenerated film and a method for removing a photoresist using the removing solution composition. CONSTITUTION: The remover for a photoresist contains (a) hydroxylamines, (b) an aromatic hudroxy compound, (c) benzotriazole or its derivative, (d) amines each having an acid dissociation constant (pKa) of 7.5-13 in an aqueous solution at 25deg.C and (e) a water-soluble organic solvent and/or (f) water.