| 摘要 |
PURPOSE: A liquid processing apparatus and a liquid processing method are provided to carry out a process, such as cleaning, with a chemical serving as a processing liquid, with respect to a semiconductor wafer W which serves as an object to be processed and which is housed in a processing chamber. CONSTITUTION: A chemical tank for storing therein the chemical has a double vessel structure which has an external tank and an internal tank housed in the external tank. Supply pipe-lines(14a,14b,14c) are provided for supplying the chemical from the external tank and the internal tank to the processing chamber. A return pipe-line is provided for returning the chemical from the processing chamber to the external tank. The outer periphery of the external tank is surrounded by a heater.
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