发明名称 DEVICE FOR FORMING COATING FILM
摘要 PURPOSE: A device for forming a coating film is provided to facilitate the washing of mask members, which are installed in a device forming a coating film of an uniform film thickness onto a substrate and cover the surface of the substrate other than an area on which the coating film is formed, and to suppress the enlargement of the device. CONSTITUTION: The device for forming a coating film on a substrate includes a substrate holding portion for holding the substrate; a coating solution nozzle(3), provided to face the substrate held by the substrate holding portion, for discharging a coating solution to the substrate; a drive mechanism for moving the coating solution nozzle(3) along a surface of the substrate relatively with respect to the substrate while the coating solution is being discharged to the surface of the substrate from the coating solution nozzle; a mask unit(4) covering a portion other than a coating film formation area of the substrate(W) and including a mask member(41) for catching the coating solution from the coating solution nozzle(3), and a cleaning mechanism, provided in the mask unit(4), for cleaning a coating film adhering to the mask member(41).
申请公布号 KR20010062439(A) 申请公布日期 2001.07.07
申请号 KR20000076708 申请日期 2000.12.14
申请人 TOKYO ELECTRON LIMITED 发明人 AKIMOTO MASAMI;ESAKI YUKIHIKO;ISHIZAKA NOBUKAZU;KITANO TAKAHIRO;KOGA NORIHISA;MORIKAWA MASATERU;OOKUMA HIROFUMI;TAKESHITA KAZUHIRO
分类号 H01L21/027;B05B13/04;B05B15/04;B05C5/02;B05C11/10;H01L21/00;(IPC1-7):H01L21/027 主分类号 H01L21/027
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