| 摘要 |
PURPOSE: A substrate processing apparatus is provided to improve the uniformity of processing by applying a coating processing, while keeping a board in high accuracy in coating and developing devices. CONSTITUTION: The substrate processing apparatus comprises a developing unit(D1), a coating unit(C1) and a plurality of cooling parts(4) which are placed in sequence from the upper side in a processing station for coating a resist. The apparatus, moreover, includes a substrate transfer device(MA) for transferring the substrate cooled in the cooling part to the coating unit(C1), a temperature detector(3A) for detecting the temperature of the area transferred by the substrate transfer device(MA), and a controller(30) for adjusting the temperature of the substrate cooled in the cooling part(4) based on a value detected by the temperature detector(3A) until the temperature of the substrate transferred to the coating unit(C1) become the coating temperature at the time of coating the resist liquid.
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