APPARATUS FOR CONTROLLING END OF POINT DETECTION AND METHOD FOR CONTROLLING ETCHING END POINT USING THE SAME

摘要

PURPOSE: An apparatus for controlling an end of point detection is provided to maximize a fine signal conversion by using a composite optical analysis technology and a compound technology regarding various optical analysis signals. CONSTITUTION: A wafer is positioned in a plasma etching apparatus(100). A plurality of optical probes(200) detect the wavelength of plasma used in etching an insulating layer formed on the wafer. A signal converter(300) compounds a plurality of spectrums collected from the optical probes. A controller(500) determines an end of point detection by using the compound spectrums from the signal converter, and memorizes the shape of the end of point detection by using a neural network analysis(400).