OPTICAL ARRANGEMENT

摘要

PURPOSE: An optical arrangement is provided to eliminate a beam-induced distortion of a lens which is exposed to a rectangular optimal beam. CONSTITUTION: The optical arrangement is specially in a microlithography projection exposure system and has a slit-shaped image field or a rotation asymmetrical illumination. An optical member(101) is exposed to the radiation of a light source rotation asymmetrically. The member(101) has absorption films(104, 105). The absorption of the films is distributed so that the absorption is rotation asymmetrical at least about complementarily to the luminance distribution of an exposure due to the radiation of the light source. An additional heating of the member(101) is caused for an energy absorbed in the films(104, 105) and a better rotation asymmetrical temperature distribution and finally, a compensation for an image error in a light induction are brought.