发明名称 SEMICONDUCTOR THIN FILM MODIFYING DEVICE
摘要 PURPOSE: To irradiate a laser only in a desirable region by a method wherein a positional deviation between a stage and a substrate is restricted. CONSTITUTION: A semiconductor thin film modifying device comprises: an airtight container in which a substrate to which a semiconductor material is adhered can be accommodated in a predetermined substrate mounting part; a light source for irradiating lights for heating the semiconductor material up to a predetermined heating temperature by irradiating on the semiconductor material; a light transmission window which is provided in an airtight container, for transmitting lights from the light source to introduce into the airtight container, a holding means which is provided in a substrate mounting part, for fixing and holding the substrate to the substrate mounting part; and a pressure control means for controlling so as not to drop lower than a vapor pressure prescribed according to temperatures of the semiconductor material fused and heated by optical irradiation.
申请公布号 KR20010062714(A) 申请公布日期 2001.07.07
申请号 KR20000082124 申请日期 2000.12.26
申请人 NEC CORPORATION 发明人 TANABE HIROSHI
分类号 H01L21/20;B23K26/12;G02F1/13;H01L21/268;(IPC1-7):G02F1/13 主分类号 H01L21/20
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