| 摘要 |
PURPOSE: A method for manufacturing an image sensor is provided to remove a stepped portion and a pollutant of a color filter array by using a chemical mechanical polishing method to flatten the color filter array. CONSTITUTION: A photo diode, a photo permeation insulating layer, and the first metal line(35) are formed on a substrate(31). The first interlayer dielectric(36) and the second metal line(37) are formed on the first metal line(35). The second interlayer dielectric and a protective layer(39) are formed on the second metal line(37). A color photoresist layer is formed on the protective layer(39). A color filter array(40,41,42) is formed by developing the color photoresist layer. The color filter array(40,41,42) is flattened by performing a chemical mechanical polishing process.
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