| 摘要 |
PURPOSE: A method for forming a micro lens of an image sensor is provided to increase sensitivity of an image sensor by maximizing a focus efficiency of a micro lens. CONSTITUTION: The first photoresist for micro lens is applied on a substrate. The first photoresist pattern is formed by exposing and developing selectively the photoresist. The first micro lens(32a) is formed by flowing and hardening the first photoresist. The second photoresist is applied thereon. The second photoresist pattern is formed by exposing and developing selectively the second photoresist. The second micro lens(34a) is formed by flowing and hardening the second photoresist.
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