发明名称 ETCH/STRIP DEVICE INTEGRALLY FORMED WITH CLEANING DEVICE
摘要 PURPOSE: An etch/strip device integrally formed with a cleaning device is provided to shorten the process time and to reduce the installing space by integrally forming the etch/strip module with a cleaning module. CONSTITUTION: An etch/strip device integrally formed with a cleaning device comprises an etching line for etching and cleaning a substrate. A strip line is installed to strip the substrate. A cleaning line is installed above the strip line so as to clean and dry the substrate. An elevator(66) is provided to move the substrate from the strip line to the cleaning line. A transfer(74) is provided to move the substrate from the etching line to the strip line. A loader(70) is provided to supply the substrate into the etching line. An unloader(72) is provided to receive the substrate from the cleaning line. The etching line includes an etch module(60) for etching the substrate, and a rinse module(62) for cleaning the substrate.
申请公布号 KR20010063572(A) 申请公布日期 2001.07.09
申请号 KR19990060691 申请日期 1999.12.22
申请人 LG.PHILIPS LCD CO., LTD. 发明人 PARK, IL RYONG
分类号 G02F1/13;H01L21/00;(IPC1-7):G02F1/13 主分类号 G02F1/13
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