| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive polyimide precursor composition developable with a basic aqueous solution, excellent in photosensitive characteristics, having high sensitivity, giving a pattern of a good shape even under small light exposure, having a high rate of a residual film after development and excellent also in shelf stability and cured film cbaracteristics and a method for producing a pattern by which a production process can be shortened and production cost can be reduced. SOLUTION: The negative type photosensitive polyimide precursor composition contains (A) a dye compound having absorption at 450-600 nm, (B) a titanocene compound or a bisimidazole compound and (C) a photosensitive polyimide precursor having a photosensitive group and a group which exhibits acidity. The velocity of dissolution of a film formed by applying and drying the composition in a basic aqueous solution is 0.01-0.5 μm/sec. A pattern is produced using the composition. |
