发明名称 |
JIG FOR ETCHING, AND APPARATUS AND METHOD FOR ETCHING |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent the destruction of an etched object held by a jig for etching even if the object is dipped in a high temperature etchant when etching the object using the jig for etching which holds the object, so that one surface of the flat etched object may face an airtight space and the other surface may be brought into contact with the etchant. SOLUTION: The jig for etching holds the flat etched object 20 so that one surface 22 may face an airtight space S and the other surface 21 may be brought into contact with an etchant 30. The volume of the airtight space can be changed.</p> |
申请公布号 |
JP2001185528(A) |
申请公布日期 |
2001.07.06 |
申请号 |
JP19990368923 |
申请日期 |
1999.12.27 |
申请人 |
MINOLTA CO LTD |
发明人 |
KAKINAGA TAKAMITSU;AGAWA KUNIHIRO;FUJII YASUHISA |
分类号 |
H01L21/683;H01L21/306;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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