发明名称 STRUCTURE OF SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To prevent moisture from entering a device from an interlayer insulating SOG film, at the side wall of the edge of a device chip and an opening for bonding. SOLUTION: A dummy pattern 202a is formed outside the circuit forming region of a device and inside the edge of a device chip in a plane pattern. Moisture is prevented from entering the circuit forming region via the SOG film by almost completely removing the SOG film from the dummy pattern 202a.
申请公布号 JP2001185551(A) 申请公布日期 2001.07.06
申请号 JP19990369811 申请日期 1999.12.27
申请人 OKI ELECTRIC IND CO LTD 发明人 NAKAMURA HIROKI
分类号 H01L23/52;H01L21/3205;H01L21/768;H01L23/00;H01L23/522;H01L23/528;H01L23/58;(IPC1-7):H01L21/320 主分类号 H01L23/52
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