| 摘要 |
PROBLEM TO BE SOLVED: To provide heating equipment that can easily obtain uniformity of the temperature distribution on the surface of a substrate to be treated. SOLUTION: This equipment has a heating plate 11 that heats the substrate to be treated 10, a ceiling plate 14 that faces the substrate 10, a heater 12 that heats the heating plate 11, an intake part 16 that introduces gas between the heating plate 11 and the ceiling plate 14, and an exhaust port 17 that dishages the gas introduced through the intake port 16. The equipment is constructed such that gas flow 18 to flow in one direction along the surface of the heating place 11 when the gas flow 18 flows from the intake port 16 to the exhaust port 17. The ceiling plate 14 is structured so that the space between the heating plate 11 and the ceiling plate 14 is relatively wide on the upstream side of the gas flow 18 and is narrow on the downstream side of the gas flow.
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