SEMICONDUCTOR EXPOSURE APPARATUS

摘要

PURPOSE: A semiconductor exposure apparatus is provided to significantly improve the exposure speed by exposing the entire edge region through an exposure process in exposing the edge region of a wafer. CONSTITUTION: A semiconductor exposure apparatus includes a lamp(110) for generating light for exposure of a wafer(140). The first nozzle(120) transmit the light generated from the lamp(110) to the second optical nozzle(125) or an optical distributer(130) through an optical fiber. The optical distributer(130) illuminates the light transmitted through the first optical nozzle to an edge region of the wafer in a circular shape to simultaneously expose the edge region of the wafer.