发明名称 EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To improve throughput by decreasing the number of times of scanning exposure. SOLUTION: Placement of a substrates 14 so as to face horizontally with respect to a substrate holder 15a (placing of the substrate by paralleling its long sides to the short sides of the substrate holder) is permitted by the size of a device and the size of the substrate 14. At this time, the placing of the region exclusive of the effective exposure region of the substrate 14 so as to protrude from the substrate holder is equally well.
申请公布号 JP2001183844(A) 申请公布日期 2001.07.06
申请号 JP19990365004 申请日期 1999.12.22
申请人 SHARP CORP 发明人 NISHIMURA YASUNORI;OKETANI HIROI;NARAKI TAKESHI
分类号 H01L21/027;G03F7/20;G03F7/22;G03F9/00;(IPC1-7):G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址
您可能感兴趣的专利