发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce the generation of a leakage current in a Schottky barrier diode. SOLUTION: A Scbottky barrier diode has an N-well 2 formed in a P-type semiconductor substrate 1, a P-well 3 formed in a position of the N-well 2 which exists at a predetermined depth, an LN layer 4 which exists in the surface layer of the N-well 2 and is formed on the P-well 3, an N-layer (cathode electrode) 5 formed in the LN-layer 4, and an anode electrode 7 formed on the LN-layer 4.
申请公布号 JP2001185740(A) 申请公布日期 2001.07.06
申请号 JP19990365955 申请日期 1999.12.24
申请人 SANYO ELECTRIC CO LTD 发明人 NISHIBE EIJI;KIKUCHI SHUICHI
分类号 H01L29/872;H01L29/47;(IPC1-7):H01L29/872 主分类号 H01L29/872
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