ELECTRON BEAM MASK, ITS MANUFACTURING METHOD AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an electron beam mask that enables a high quality exposure and eliminates the problems of a doughnut pattern and a leaf pattern in batch exposure process and its method of manufacturing, as well as an exposure method that can perform exposure of high quality rising the electron beam mask. SOLUTION: This electron beam mask 1 has thin films (membranes) 5 embedded in an aperture 4 that are the object of the doughnut and the leaf problems and protect unexposed part 3. The thin films 5 are made from a material through which an electron beam can pass.