METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE IMPROVING OVERLAY ACCURACY

摘要

PURPOSE: A method for manufacturing a semiconductor device improving an overlay accuracy is provided to improve the reliability of an overlay accuracy measurement by preventing efficiently the generation of an inferior overlay pattern due to an over-exposure process. CONSTITUTION: A reticle formed with four rectangular shielding patterns is prepared on a transparent substrate. A photoresist is applied on an upper portion of the semiconductor substrate. The photoresist is a positive photoresist. The photoresist is exposed by using the reticle. An inner box pattern of the rectangle is formed by developing the photoresist.