| 摘要 |
PURPOSE: A sub-rod in a dry etching apparatus is provided to uniformly distribute the weight of a focus ring and prevent a misalignment of the focus ring by separately manufacturing a lower plate and a support pole. CONSTITUTION: A sub-rod(60) in a dry etching apparatus includes a support pole(62) for supporting a focus ring, and a lower plate(64) to which a sub-rod support is fixed, for fixing the support pole(62). The support pole(62) and the lower plate(64) are manufactured in a separate type. The support pole(62) is inserted into an inserting groove(66) formed at the center of the lower plate(64) and fixed to the lower plate(64). A steel heartwood(68) is inserted into the support pole(62). A plurality of screw hole(70) are formed in the lower plate(64) so that the lower plate(64) can be fixed to an air cylinder by means of a screw(72).
|
