发明名称 ELECTRIC PLATING BARRIER LAYER
摘要 PROBLEM TO BE SOLVED: To provide a method for preparing a surface for depositing electrochemically. SOLUTION: This method comprises steps of: forming a high conductivity barrier layer on a surface; and depositing a seed layer on this high conductivity barrier layer. Furthermore, a method for filling a structure on a base is provided. This method comprise a step 302 of depositing the high conductivity barrier layer on one or more surfaces of the structure; a step 304 of depositing the seed layer on this barrier layer; and a step 306 of electrochemically depositing a metal to fill the structure.
申请公布号 JP2001185510(A) 申请公布日期 2001.07.06
申请号 JP20000286144 申请日期 2000.08.16
申请人 APPLIED MATERIALS INC 发明人 DING PEIJUN;CHIANG TONY;YAO TSE-YONG;CHIN BARRY
分类号 C25D5/34;C25D3/00;C25D7/12;H01L21/28;H01L21/288;H01L21/3205;H01L21/768;H01L23/52;H01L23/522;(IPC1-7):H01L21/288 主分类号 C25D5/34
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