发明名称 |
ELECTRIC PLATING BARRIER LAYER |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for preparing a surface for depositing electrochemically. SOLUTION: This method comprises steps of: forming a high conductivity barrier layer on a surface; and depositing a seed layer on this high conductivity barrier layer. Furthermore, a method for filling a structure on a base is provided. This method comprise a step 302 of depositing the high conductivity barrier layer on one or more surfaces of the structure; a step 304 of depositing the seed layer on this barrier layer; and a step 306 of electrochemically depositing a metal to fill the structure.
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申请公布号 |
JP2001185510(A) |
申请公布日期 |
2001.07.06 |
申请号 |
JP20000286144 |
申请日期 |
2000.08.16 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
DING PEIJUN;CHIANG TONY;YAO TSE-YONG;CHIN BARRY |
分类号 |
C25D5/34;C25D3/00;C25D7/12;H01L21/28;H01L21/288;H01L21/3205;H01L21/768;H01L23/52;H01L23/522;(IPC1-7):H01L21/288 |
主分类号 |
C25D5/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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